Publications
X Author: O. Auciello
2009
Ramirez, M.O., A. Kumar, S.A. Denev, N.J. Podraza, X.S. Xu, R.C. Rai, Y.H. Chu, J. Seidel, L.W. Martin, S.-Y. Yang, E. Saiz, J.F. Ihlefeld, S. Lee, J. Klug, S.W. Cheong, M.J. Bedzyk, O. Auciello, D.G. Schlom, Ramamoorthy Ramesh, J. Orenstein, J.L. Musfeldt, and V. Gopalan."Magnon sidebands and spin-charge coupling in bismuth ferrite probed by nonlinear optical spectroscopy."Physical Review B - Condensed Matter and Materials Physics
79 (2009). DOI
Ramirez, M.O., A. Kumar, S.A. Denev, Y.H. Chu, J. Seidel, L.W. Martin, S.-Y. Yang, R.C. Rai, X.S. Xue, J.F. Ihlefeld, N.J. Podraza, E. Saiz, S. Lee, J. Klug, S.W. Cheong, M.J. Bedzyk, O. Auciello, D.G. Schlom, J. Orenstein, Ramamoorthy Ramesh, J.L. Musfeldt, A.P. Litvinchuk, and V. Gopalan."Spin-charge-lattice coupling through resonant multimagnon excitations in multiferroic BiFe O3."Applied Physics Letters
94 (2009). DOI
2003
Nagarajan, V., A. Roytburd, A. Stanishevsky, S. Prasertchoung, T. Zhao, L. Chen, J. Melngailis, O. Auciello, and Ramamoorthy Ramesh."Dynamics of ferroelastic domains in ferroelectric thin films."Nature Materials
2 (2003) 43-47. DOI
Fan, W., S. Saha, J.A. Carlisle, O. Auciello, R.P.H. Chang, and Ramamoorthy Ramesh."Layered Cu-based electrode for high-dielectric constant oxide thin film-based devices."Applied Physics Letters
82 (2003) 1452-1454. DOI
Fan, W., B. Kabius, J.M. Miller, S. Saha, J.A. Carlisle, O. Auciello, R.P.H. Chang, and Ramamoorthy Ramesh."Materials science and integration bases for fabrication of (Ba xSr1-x)TiO3 thin film capacitors with layered Cu-based electrodes."Journal of Applied Physics
94 (2003) 6192-6200. DOI
2002
Auciello, O., A.M. Dhote, Ramamoorthy Ramesh, B.T. Liu, S. Aggarwal, A.H. Mueller, N.A. Suvarova, and E.A. Irene."Development of materials integration strategies for electroceramic film-based devices via complementary in situ and ex situ studies of film growth and interface processes."Integrated Ferroelectrics
46 (2002) 295-306. DOI
Liu, B.T., K. Maki, S. Aggarwal, B. Nagaraj, V. Nagarajan, L. Salamanca-Riba, Ramamoorthy Ramesh, A.M. Dhote, and O. Auciello."Low-temperature integration of lead-based ferroelectric capacitors on Si with diffusion barrier layer."Applied Physics Letters
80 (2002) 3599-3601. DOI
2001
Ramesh, Ramamoorthy, S. Aggarwal, and O. Auciello."Science and technology of ferroelectric films and heterostructures for non-volatile ferroelectric memories."Materials Science and Engineering: R: Reports
32 (2001) 191-236. DOI
Krauss, A.R., O. Auciello, A.M. Dhote, J. Im, S. Aggarwal, Ramamoorthy Ramesh, E.A. Irene, Y. Gao, and A.H. Mueller."Studies of ferroelectric film growth and capacitor interface processes via in situ analytical techniques and correlation with electrical properties."Integrated Ferroelectrics
32 (2001) 121-131.
Dhote, A.M., O. Auciello, D.M. Gruen, and Ramamoorthy Ramesh."Studies of thin film growth and oxidation processes for conductive Ti-Al diffusion barrier layers via in situ surface sensitive analytical techniques."Applied Physics Letters
79 (2001) 800-802. DOI
2000
Aggarwal, S., B. Nagaraj, I.G. Jenkins, H. Li, R.P. Sharma, L. Salamanca-Riba, Ramamoorthy Ramesh, A.M. Dhote, A.R. Krauss, and O. Auciello."Correlation between oxidation resistance and crystallinity of Ti-Al as a barrier layer for high-density memories."Acta Materialia
48 (2000) 3387-3394. DOI
Auciello, O., A.R. Krauss, J. Im, A. Dhote, D.M. Gruen, E.A. Irene, Y. Gao, A.H. Mueller, and Ramamoorthy Ramesh."Studies of ferroelectric heterostructure thin films and interfaces, via in situ analytical techniques."Integrated Ferroelectrics
28 (2000) 1-12. DOI
1999
Auciello, O., A.R. Krauss, I.M. Jaemo, A. Dhote, D.M. Gruen, S. Aggarwal, Ramamoorthy Ramesh, E.A. Irene, Y. Gao, and A.H. Mueller."Studies of ferroelectric heterostructure thin films, interfaces, and device-related processes via in situ analytical techniques."Integrated Ferroelectrics
27 (1999) 103-118. DOI
Krauss, A.R., A. Dhote, O. Auciello, J. Im, Ramamoorthy Ramesh, and S. Aggarwal."Studies of hydrogen-induced degradation processes in Pb(Zr1-xTix)O3 (PZT) and SrBi2Ta2O9 (SBT) ferroelectric film-based capacitors."Integrated Ferroelectrics
27 (1999) 147-157. DOI
Dhote, A.M., A.R. Krauss, O. Auciello, J. Im, D.M. Gruen, Ramamoorthy Ramesh, S.P. Pai, and T. Venkatesan."Studies of metallic species incorporation during growth of SrBi2Ta2O9 films on YBa2Cu3O7-x substrates using mass spectroscopy of recoiled ions."Materials Research Society Symposium - Proceedings
541 (1999) 281-286.
1998
Gruverman, A., S.A. Prakash, S. Aggarwal, Ramamoorthy Ramesh, O. Auciello, and H. Tokumoto."Nanoscale investigation of polarization retention loss in ferroelectric thin films via scanning force microscopy."Materials Research Society Symposium - Proceedings
493 (1998) 53-58.
Auciello, O., A. Gruverman, H. Tokumoto, S.A. Prakash, S. Aggarwal, and Ramamoorthy Ramesh."Nanoscale scanning force imaging of polarization phenomena in ferroelectric thin films."MRS Bulletin
23 (1998) 33-41.
Auciello, O., J.F. Scott, and Ramamoorthy Ramesh."The physics of ferroelectric memories."Physics Today
51 (1998) 22-27. DOI
Auciello, O., C.M. Foster, and Ramamoorthy Ramesh."Processing technologies for ferroelectric thin films and heterostructures."Annual Review of Materials Science
28 (1998) 501-531. DOI
Im, J., A.R. Krauss, A.M. Dhote, D.M. Gruen, O. Auciello, Ramamoorthy Ramesh, and R.P.H. Chang."Studies of metallic species and oxygen incorporation during sputter-deposition of SrBi2Ta2O9 films, using mass spectroscopy of recoiled ions."Applied Physics Letters
72 (1998) 2529-2531. DOI
1997
Gruverman, A., H. Tokumoto, A.S. Prakash, S. Aggarwal, B. Yang, M. Wuttig, Ramamoorthy Ramesh, O. Auciello, and T. Venkatesan."Nanoscale imaging of domain dynamics and retention in ferroelectric thin films."Applied Physics Letters
71 (1997) 3492-3494. DOI
Gruverman, A., O. Auciello, Ramamoorthy Ramesh, and H. Tokumoto."Scanning force microscopy of domain structure in ferroelectric thin films: Imaging and control."Nanotechnology
8 (1997) A38-A43. DOI
1996
Auciello, O., and Ramamoorthy Ramesh."Electroceramic Thin Films Part I: Processing."MRS Bulletin
21 (1996) 21-24. DOI
Auciello, O., and R. Ramamoorthy."Electroceramic Thin Films Part II: Device Applications."MRS Bulletin
21 (1996) 29-32. DOI
Auciello, O., and R. Ramamoorthy."Electroceramic Thin Films Part II: Device Applications."MRS Bulletin
21 (1996) 29-32. DOI