Publications
X Author: Patrick P. Naulleau
2019
Stern, Rebecca D., Danielle C. Hutchison, Morgan R. Olsen, Lev N. Zakharov, May Nyman, Kristin A. Persson, Kurt G. Ronse, Paolo A. Gargini, Patrick P. Naulleau, and Toshiro Itani."Alkyltin Keggin clusters as EUVL photoresist technology."International Conference on Extreme Ultraviolet Lithography 2019International Conference on Extreme Ultraviolet Lithography 2019
(2019). DOI