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Thermal annealing of photoluminescent Si deposited on silica aerogels

Publication Type

Journal Article

Authors

Cao, Wanqing, Arlon J. Hunt

Abstract

Photoluminescence (PL) of chemically vapor deposited Si on silica aerogels has been investigated as a function of annealing temperature up to 650°C in air. The PL peak red shifts considerably with temperatures up to 350°C and then slightly blue shifts above 350°C. There are at least two different oxidation stages in the thermal annealing of porous Si: surface oxidation below 350°C, which results in higher luminescence yield particularly for large Si particles, and internal oxidation above 350°C, which reduces the effective particle size.

Journal

Solid State Communications

Volume

91

Year of Publication

1994

Notes

0038-1098doi: DOI: 10.1016/0038-1098(94)90564-9

Organization

Laser Technologies Group, Energy Storage and Distributed Resources Division

        

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