Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma
Publication Type
Journal Article
Date Published
08/2008
Authors
DOI
Abstract
Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply charged titanium ions were identified by isotope-induced broadening at mass/charge 12. Due to their high potential energy, Ti4+ ions give a high yield of secondary electrons, which in turn are likely to be responsible for the generation of multiply charged states.
Journal
Applied Physics Letters
Volume
93
Year of Publication
2008
Issue
7
Organization
Building Technologies Department, Building Technology and Urban Systems Division, Windows and Envelope Materials
Research Areas
Advanced Coatings, Building Façade Solutions, Windows and Daylighting, W and D: Dynamic Glazings and Advanced Coatings, BTUS Windows and Daylighting