Direct domain wall thickness measurement using scanning nonlinear dielectric microscopy

Conference Paper

Cho, Y., K. Matsuura, N. Valanoor, Ramamoorthy Ramesh

10.1080/00150190390222961

Using Scanning Nonlinear Dielectric Microscopy (SNDM) which has attained sub-nanometer resolution, we measured the linear dielectric constant of a-domains and c-domains in the (1,0,0) and (0,0,1) oriented PbZr 0.2 Ti 0.8 O 3 thin film and confirmed that the dielectric constant of a-domain is higher than that of c-domain. Next, we observed 90 domain walls (a-c domain walls) and 180 domain walls (c-c domain walls) and we obtained the minimum value of 180 c-c domain wall thickness was 1.87 nm and 90 a-c domain wall was 2.52 nm.

Ferroelectrics

292

2003

00150193

cited By 1

Ramesh Lab